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The scientists initially needed to introduce a determined number of atoms precisely into the wires using ion implantation.
The method is based on an ion implantation technique, a process in which ions are accelerated under an electrical field and smashed into a semiconductor.
"Our work shows that the carbon ion implantation technique has great potential for the direct synthesis of wafer-scale graphene for integrated circuit technologies."
"Kim's method relies on ion implantation, a microelectronics-compatible technique normally used to introduce impurities into semiconductors.
Kim explained that the activation annealing temperature could be lowered by performing the ion implantation at an elevated temperature.
According to Kim, the ion implantation technique also offers finer control on the final structure of the product than other fabrication methods,
as the graphene layer thickness can be determined precisely by controlling the dose of carbon ion implantation.""Our synthesis method is controllable and scalable,
as it can be implemented using established ion implantation infrastructure in the semiconductor industry, "Ward said. The method uses a low energy ion gun to add small numbers of helium ions into the material after it has been produced.
The method is based on an ion implantation technique, a process in which ions are accelerated under an electrical field and smashed into a semiconductor.
In a paper published this week in the journal Applied Physics Letters("Wafer-scale synthesis of multi-layer graphene by high-temperature carbon ion implantation"),from AIP Publishing
Wafer-scale (4 inch in diameter) synthesis of multi-layer graphene using high-temperature carbon ion implantation on nickel/Sio2/silicon.
"Our work shows that the carbon ion implantation technique has great potential for the direct synthesis of wafer-scale graphene for integrated circuit technologies."
"Kim's method relies on ion implantation, a microelectronics-compatible technique normally used to introduce impurities into semiconductors.
Kim explained that the activation annealing temperature could be lowered by performing the ion implantation at an elevated temperature.
According to Kim, the ion implantation technique also offers finer control on the final structure of the product than other fabrication methods,
as the graphene layer thickness can be determined precisely by controlling the dose of carbon ion implantation.""Our synthesis method is controllable and scalable,
as it can be implemented using established ion implantation infrastructure in the semiconductor industry, Ward said. The method uses a low energy ion gun to add small numbers of helium ions into the material after it has been produced.
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